This horizontal 316L stainless steel vessel is designed for gaseous high-purity semiconductor precursors, suited to specialty high-purity gases such as arsine, phosphine and borane. A passivated inner wall suppresses metal impurity release, preserving the gas's original purity and avoiding process contamination. The mirror-polished outer wall suits cleanroom environments and is easy to wipe down for maintenance. The horizontal layout promotes stable gas flow, and ports at both ends make integration into gas supply piping easy. With reliable sealing performance, it provides a safe and stable container solution for specialty gas supply in chip manufacturing.