The 20L pressure-resistant storage drum uses a 316L stainless steel substrate with a dedicated acid and alkali resistant coating on the inner wall, suited to corrosive semiconductor metal precursors, while the electropolished outer wall is easy to clean and resists dust. It handles a wide range from sub-zero to high temperatures with ample pressure margin, and a dual-gauge valve set on top provides sealed, pressure-controlled delivery, isolating moisture and air to prevent source material degradation. A reinforced protective lift frame aids cleanroom transfer, and the drum resists media residue — suited to medium-volume precursor storage and stable feeding in ALD and CVD mass production.